Title:
GATE VALVE STRUCTURE AND SUBSTRATE PROCESSOR EQUIPED WITH THE SAME
Document Type and Number:
WIPO Patent Application WO/2010/113891
Kind Code:
A1
Abstract:
Disclosed is a gate valve structure including a valve box having a port with a first valve seat and a second valve seat and a valve provided with a sealing member intended to seal the port.
The gate valve structure is further provided with a shielding member capable of deflecting to sit on the second valve seat when the valve closes the port thereby shielding the room between the sealing member and the port such that the shielding member deflects to maintain contact between the shielding member and the second valve seat when the valve closes the port under the normal condition as well as under a high temperature.
Inventors:
HIROKI TSUTOMU (JP)
NOSE MASAAKI (JP)
MATSUSHITA MASANAO (JP)
NISHIBA TAKEHIRO (JP)
NOSE MASAAKI (JP)
MATSUSHITA MASANAO (JP)
NISHIBA TAKEHIRO (JP)
Application Number:
PCT/JP2010/055599
Publication Date:
October 07, 2010
Filing Date:
March 29, 2010
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
HIROKI TSUTOMU (JP)
NOSE MASAAKI (JP)
MATSUSHITA MASANAO (JP)
NISHIBA TAKEHIRO (JP)
HIROKI TSUTOMU (JP)
NOSE MASAAKI (JP)
MATSUSHITA MASANAO (JP)
NISHIBA TAKEHIRO (JP)
International Classes:
F16K51/02; F16K1/24
Foreign References:
| JP2006170373A | 2006-06-29 | |||
| US20050279956A1 | 2005-12-22 | |||
| JP2001004039A | 2001-01-09 | |||
| JP2008045640A | 2008-02-28 | |||
| JPS6013960U | 1985-01-30 | |||
| JP2002228043A | 2002-08-14 |
Attorney, Agent or Firm:
ITOH, TADAHIKO (JP)
Tadahiko Ito (JP)
Tadahiko Ito (JP)
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