Title:
GAS SUPPLY CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/208621
Kind Code:
A1
Abstract:
This gas supply control device for supplying gas to a processing chamber in which an object to be processed is processed, is provided with: a first port connected to a gas source of a purge gas; a second port connected to a gas source of a processing gas; a merge pipe in which the purge gas and the processing gas supplied respectively from the first port and the second port merge and flow; a first flow rate controller provided between the first port and the merge pipe; and a second flow rate controller provided between the second port and the merge pipe. A gas flow channel through which the purge gas flows is formed from the output side of the first flow rate controller to the input side of the second flow rate controller.
Inventors:
OGAWA YOSHIFUMI (JP)
KOUZUMA YUTAKA (JP)
KOUZUMA YUTAKA (JP)
Application Number:
PCT/JP2021/013349
Publication Date:
October 06, 2022
Filing Date:
March 29, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
F15B11/06
Domestic Patent References:
| WO2013046660A1 | 2013-04-04 |
Foreign References:
| JPH0677234U | 1994-10-28 | |||
| JPH03115663U | 1991-11-29 | |||
| US5605179A | 1997-02-25 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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