Title:
GAS REMOVING APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2020/141960
Kind Code:
A1
Abstract:
The present invention relates to a gas removing apparatus for removing gas in a pipe in a valve manifold box for distributing the gas to a substrate processing apparatus, wherein the gas is transferred to the substrate processing apparatus through the pipe. A gas removing apparatus according to the present invention includes: a connection line connected to the valve manifold box-side end portion of the pipe; a purge gas injection unit for injecting purge gas into the pipe through the connection line; and an exhaust unit for exhausting the gas in the pipe to the outside through the connection line.
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| JPS63219134 | WAFER HANDLING DEVICE OF DIFFUSION FURNACE |
Inventors:
JANG WON SEOK (KR)
JO SU MIN (KR)
JO SU MIN (KR)
Application Number:
PCT/KR2020/000200
Publication Date:
July 09, 2020
Filing Date:
January 06, 2020
Export Citation:
Assignee:
GODOENG CO LTD (KR)
SAMSUNG ELECTRONICS CO LTD (KR)
SAMSUNG ELECTRONICS CO LTD (KR)
International Classes:
H01L21/67; F16K11/00; F16K24/00; H01L21/02
Domestic Patent References:
| WO2001005487A1 | 2001-01-25 |
Foreign References:
| KR19980069172A | 1998-10-26 | |||
| KR20010049497A | 2001-06-15 | |||
| KR20160068008A | 2016-06-15 | |||
| KR101077451B1 | 2011-10-26 | |||
| KR101974647B1 | 2019-05-02 |
Attorney, Agent or Firm:
HONG, Geondu (KR)
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