Title:
GAS BARRIER FILM, FILM LAMINATE, AND VACUUM INSULATION MATERIAL
Document Type and Number:
WIPO Patent Application WO/2021/132548
Kind Code:
A1
Abstract:
A gas barrier film according to the present invention comprises a resin substrate film having a vapor-deposited layer of inorganic material, and a gas barrier layer formed on the vapor-deposited layer on the substrate film. The gas barrier layer is formed at least from an inorganic lamellar compound, and the substrate film has an elongation of 1.1% or less. This results in a gas barrier film having a configuration in which a gas barrier layer containing an inorganic lamellar compound is formed on a vapor-deposited layer on a resin substrate film, wherein a desired gas barrier property can be satisfactorily realized.
Inventors:
UMEDA AKIHIRO
BONDE MARI
KOMURA AKIKO
AKEYAMA YUKAKO
BONDE MARI
KOMURA AKIKO
AKEYAMA YUKAKO
Application Number:
PCT/JP2020/048661
Publication Date:
July 01, 2021
Filing Date:
December 25, 2020
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
B32B9/00; F16L59/065
Foreign References:
| JP2018025300A | 2018-02-15 | |||
| JP2019064074A | 2019-04-25 |
Attorney, Agent or Firm:
ARCO PATENT & TRADEMARK ATTORNEYS (JP)
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