Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
FLOW RATE CONTROL VALVE, METHOD FOR PRODUCING FLOW RATE CONTROL VALVE, AND FLOW RATE CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/119828
Kind Code:
A1
Abstract:
This flow rate control valve (4) comprises a valve seat (41), a valve body (42), a drive section (43), and a support body (44) that supports the valve body via a diaphragm (48). The valve body additionally includes a facing surface (42F) positioned on the opposite side from a valve seat surface (41S) with respect to a seating surface (42S), and a circumferential surface (42P) connecting the seating surface and the facing surface. The diaphragm is connected with the circumferential surface of the valve body at a position closer to the seating surface side than the facing surface. The support body has a first surface (44S1) positioned on the same side as the facing surface and a second surface (44S2) positioned closer to the valve seat side than the first surface with reference to the position of the film surface of the diaphragm. When the diaphragm is in an undeformed state, the facing surface and the first surface are positioned on the same plane.

Inventors:
SHAKUDO KAZUYA (JP)
HAYASHI SHIGEYUKI (JP)
NAGASAWA MASAYUKI (JP)
Application Number:
PCT/JP2022/039109
Publication Date:
June 29, 2023
Filing Date:
October 20, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HORIBA STEC CO LTD (JP)
International Classes:
F16K1/36; F16K7/12; F16K37/00
Foreign References:
JP2010230159A2010-10-14
JPH067240Y21994-02-23
CN203282329U2013-11-13
JP2011214713A2011-10-27
JP2000035821A2000-02-02
CN102797870A2012-11-28
Attorney, Agent or Firm:
SANO PATENT OFFICE (JP)
Download PDF: