Title:
EXPOSURE SYSTEM, FORMING METHOD FOR ALIGNMENT FILM, MANUFACTURING METHOD FOR OPTICAL ELEMENT, AND OPTICAL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2023/101013
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: an exposure system with which it is possible to easily create an alignment film corresponding to an optical element for which the focal distance continuously changes; a forming method for the alignment film carried out by this exposure system; a manufacturing method for an optical element that uses this alignment film; and an optical element. In order to solve the problem, the present invention includes: a light source; a beam splitter that splits light emitted by the light source; a beam combiner that combines the light split by the beam splitter and that includes a first surface that transmits the light and a second surface that reflects the light; light collection elements provided upstream from the beam combiner; and a polarization conversion element. At least one of the light collection elements has a focal distance that continuously changes in a direction orthogonal to an optical axis and away from the optical axis, and a maximum/minimum focal distance ratio is greater than 1.1.
Inventors:
MORI MASAO (JP)
KITAHARA YU (JP)
KITAHARA YU (JP)
Application Number:
PCT/JP2022/044588
Publication Date:
June 08, 2023
Filing Date:
December 02, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/20; G02B3/02; G02B5/04; G02B5/30; G02B5/32; G02B13/18
Domestic Patent References:
| WO2020022504A1 | 2020-01-30 | |||
| WO2019004336A1 | 2019-01-03 |
Foreign References:
| JPH10284369A | 1998-10-23 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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