Title:
EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/157888
Kind Code:
A1
Abstract:
This exposure method includes: using an exposure device that uses a mask, to form a first exposure pattern in a first region in each of a plurality of pattern formation regions on a substrate, using exposure light via a first mask, and to form a second exposure pattern in a second region separated from the first region in each of the pattern formation regions, using exposure light via a second mask; using an exposure device that uses a spatial light modulator for modulating exposure light on the basis of output from an exposure pattern determination unit, to form an exposure pattern determined on the basis of positions of the first and second exposure patterns between the first and second regions in each of the pattern formation regions, using exposure light via the spatial light modulator .
Inventors:
WATANABE YOJI (JP)
Application Number:
PCT/JP2023/005314
Publication Date:
August 24, 2023
Filing Date:
February 15, 2023
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F9/00; G03F7/20; H01L21/30
Foreign References:
| JP2007199711A | 2007-08-09 | |||
| JP2002303968A | 2002-10-18 | |||
| JP2011181715A | 2011-09-15 | |||
| JP2008268578A | 2008-11-06 |
Attorney, Agent or Firm:
KATAYAMA, Shuhei (JP)
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