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Patent Searching and Data


Title:
ELECTRON SOURCE, METHOD FOR MANUFACTURING SAME, AND ELECTRON BEAM DEVICE IN WHICH SAME IS USED
Document Type and Number:
WIPO Patent Application WO/2022/064557
Kind Code:
A1
Abstract:
The purpose of the present invention is to improve the current stability of a field emission electron source and a Schottky electron source in which the {100} plane of a hexaboride monocrystal is used as an electron emission surface. In the present invention, the distal end of a tip of a <100>-axis hexaboride monocrystal constituting an electron source is formed such that: a top facet of a {100} plane surrounded by side facets configured from at least four {n10} planes and at least four {n11} planes having n = 1, 2, 3 as integers is formed; and the total area of the side facets of the {n11} planes is greater than the total area of the side facets of the {n10} planes.

Inventors:
KUSUNOKI TOSHIAKI (JP)
ARAI NORIAKI (JP)
HASHIZUME TOMIHIRO (JP)
KASUYA KEIGO (JP)
Application Number:
PCT/JP2020/035749
Publication Date:
March 31, 2022
Filing Date:
September 23, 2020
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J9/02; H01J1/30
Domestic Patent References:
WO2016140177A12016-09-09
Foreign References:
JPS6031059B21985-07-19
JP2018142453A2018-09-13
JPS5693244A1981-07-28
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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