Title:
ELECTRON BEAM-BASED EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/038446
Kind Code:
A1
Abstract:
A light source device according to one embodiment of the present invention outputs an extreme ultraviolet light source on the basis of an electron beam, the light source device comprising: a chamber; an electron beam emission unit that generates an electron beam inside the chamber and includes a cathode electrode and a plurality of emitters including a carbon-based material and disposed spaced apart from each other on the cathode electrode; and an anode electrode which is located inside the chamber so as to be spaced apart from the electron beam emission unit and which becomes ionized and generates plasma upon being struck by the electron beam. Extreme ultraviolet rays are generated from the plasma.
Inventors:
PARK KYU CHANG (KR)
YOO SUNG TAE (KR)
YOO SUNG TAE (KR)
Application Number:
PCT/KR2022/013482
Publication Date:
March 16, 2023
Filing Date:
September 07, 2022
Export Citation:
Assignee:
UNIV INDUSTRY COOPERATION GROUP KYUNG HEE UNIV (KR)
International Classes:
H05G2/00; G03F7/20
Foreign References:
| JP2007012603A | 2007-01-18 | |||
| KR101341672B1 | 2013-12-16 | |||
| KR20160102744A | 2016-08-31 | |||
| KR20150090502A | 2015-08-06 | |||
| KR20190067614A | 2019-06-17 |
Attorney, Agent or Firm:
OH, Se Joong (KR)
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