Title:
DIAPHRAGM AND CHEMICAL SOLUTION CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/112476
Kind Code:
A1
Abstract:
A diaphragm (30) which is applied to a chemical solution control device for controlling the circulation of a chemical solution for use in a semiconductor production process and which has applied thereto pressure by a working gas comprises: a membrane part (31) which is formed from a fluorine resin resistant to the chemical solution; and a permeation inhibition layer (42) which is disposed on a surface (31b) of the membrane part having applied thereto pressure by the working gas and which is made less permeable to the working gas than the membrane part.
Inventors:
YOSHIDA MASAKI (JP)
NISHIO YOSHIFUMI (JP)
KUMAGAI TAKAYUKI (JP)
NISHIDA SHIGENOBU (JP)
NISHIO YOSHIFUMI (JP)
KUMAGAI TAKAYUKI (JP)
NISHIDA SHIGENOBU (JP)
Application Number:
PCT/JP2022/039090
Publication Date:
June 22, 2023
Filing Date:
October 20, 2022
Export Citation:
Assignee:
CKD CORP (JP)
International Classes:
F04B43/02; F16J3/02; H01L21/027
Foreign References:
| JP2012017658A | 2012-01-26 | |||
| JP2013227870A | 2013-11-07 | |||
| JP2009085339A | 2009-04-23 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
Download PDF:
Previous Patent: LIQUID CRYSTAL DISPLAY ELEMENT AND DISPLAY DEVICE
Next Patent: TENSION ROD ALIGNMENT MEMBER AND TENSION ROD ALIGNMENT SYSTEM
Next Patent: TENSION ROD ALIGNMENT MEMBER AND TENSION ROD ALIGNMENT SYSTEM