Title:
CONTROL VALVE CONTROL DEVICE AND CONTROL VALVE ADJUSMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2018/230469
Kind Code:
A1
Abstract:
In a control valve control device and a control valve adjustment method, provided are: an LVDT voltage processing unit (33) and an LVDT voltage detection unit (32) serving as a valve opening detection unit for detecting the degree of opening of an opening/closing valve (12) on the basis of a detected voltage value detected by an LVDT (31); a voltage value setting unit (51) for, on the basis of the detected voltage value, setting a fully-closed voltage value for when the opening/closing valve (12) is fully closed and a fully-open voltage value for when the opening/closing valve is fully open; a gain setting unit (53) for setting a gain on the basis of an operation time and an overshoot amount of the opening/closing valve (12) when changing from a preset first command value to a second command value; and an offset setting unit (54) for setting an offset of a servo valve (13) on the basis of a deviation between a neutral command value of the servo valve (13) and the detected voltage value. A command value serving as a target opening of the servo valve (13) is complemented by the offset and gain to set a drive current.
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Inventors:
MORI HIROMITSU (JP)
Application Number:
PCT/JP2018/022067
Publication Date:
December 20, 2018
Filing Date:
June 08, 2018
Export Citation:
Assignee:
MITSUBISHI HITACHI POWER SYS (JP)
International Classes:
G05B11/36; F01D17/10; F15B9/09
Foreign References:
| JP2013053550A | 2013-03-21 | |||
| JP2000213666A | 2000-08-02 | |||
| JP2002161797A | 2002-06-07 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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