CONTINUOUS GAS REACTION DEVICE, AND CONTINUOUS DISSOLVED GAS REACTION DEVICE

Title:

CONTINUOUS GAS REACTION DEVICE, AND CONTINUOUS DISSOLVED GAS REACTION DEVICE

Document Type and Number:

WIPO Patent Application WO/2013/140877

Kind Code:

A1

Abstract:

[Problem] To provide a continuous gas reaction device and the like having a small, simple structure, capable of continuous and high-volume processing of substances being processed, and capable of suppressing the generation and growth of scales in downstream processes. [Solution] A gas reaction device connecting reaction vessels (3A-3D) in a multiple-stage line, solid slurry (S) or liquid and gas (G1-G4) being caused to react in each reaction vessel, the gas reaction device being a continuous gas reaction apparatus (3) or the like that causes the diffused-air state of the gas to vary in each reaction vessel according to the reaction in each reaction vessel. The variation of the diffused-air state of the gas can be performed by varying at least one of the flow amount of the gas being diffused, the gas-bubble diameter, and the type. The solid slurry or the liquid and gas can also be used as the substance caused to react with each other to induce scales. When solid slurry or liquid must be generated outside the reaction vessel (3), a dissolution vessel (2) may be arranged at the stage before the reaction vessel (3A).

Inventors:

TATSUMI YOSHINOBU (JP)
KONDOU KENZABUROU (JP)

Application Number:

PCT/JP2013/052665

Publication Date:

September 26, 2013

Filing Date:

February 06, 2013

Export Citation:

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Assignee:

TAIHEIYO CEMENT CORP (JP)

International Classes:

B01J19/24; B01D53/62; B01J10/00; B09B3/00; C02F1/58; C02F5/00; C02F5/02

Foreign References:

JP2005288328A	2005-10-20
JP2010137141A	2010-06-24
JP2003165722A	2003-06-10
JP2000354843A	2000-12-26