Title:
COMPOUND, ACID GENERATOR COMPRISING SAID COMPOUND, PHOTORESIST, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAID PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2023/204123
Kind Code:
A1
Abstract:
Provided is a novel compound which has such acid generating capability that the compound is decomposed by the irradiation with i line to generate a sulfonic acid and which can keep the acid generating capability thereof at a satisfactory level in the whole area of a resist layer even when the thickness of the resist layer is increased. The compound (1) according to the present invention is represented by formula (1). In formula (1), R1 and R2 each independently represent a hydrocarbon group that may have a substituent. R3 represents a hydrogen atom, a OR13 group or a R13 group, in which the R13 represents a hydrocarbon group that may have a substituent. R4 represents a hydrogen atom or R14, in which the R14 represents a hydrocarbon group that may have a substituent. The case where each of R3 and R4 represents a hydrogen atom at the same time is excluded.
Inventors:
SHIBAGAKI TOMOYUKI (JP)
NAKAMURA YUJI (JP)
KAJIHARA TAKUTO (JP)
KIZU TOMOHITO (JP)
NAKAMURA YUJI (JP)
KAJIHARA TAKUTO (JP)
KIZU TOMOHITO (JP)
Application Number:
PCT/JP2023/014912
Publication Date:
October 26, 2023
Filing Date:
April 12, 2023
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
C07D311/16; C07D311/18; C09K3/00; G03F7/004; G03F7/20
Domestic Patent References:
| WO2016072049A1 | 2016-05-12 |
Foreign References:
| JP2004099726A | 2004-04-02 | |||
| JP2023007395A | 2023-01-18 | |||
| JP2023014435A | 2023-01-30 |
Attorney, Agent or Firm:
G-CHEMICAL INTELLECTUAL PROPERTY FIRM (JP)
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