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Title:
CLEANING LIQUID, CLEANING APPARATUS AND CLEANING METHOD FOR RESIST REMOVER LIQUID FILTRATION FILTER
Document Type and Number:
WIPO Patent Application WO/2015/008443
Kind Code:
A1
Abstract:
According to the present invention, a filter used for filtration of a resist remover liquid, which has removed a positive resist from a substrate, is recycled for reuse as a filtration filter by removing the resist therefrom. By immersing a used resist remover liquid filtration filter in a cleaning liquid for resist remover liquid filtration filters, said cleaning liquid containing 2.5-12.5% by mass of ammonia relative to the total mass of the cleaning liquid and 8.8-17.5% by mass of hydrogen peroxide relative to the total mass of the cleaning liquid, a resist adhering to the filtration filter is able to be removed, thereby enabling reuse of the resist remover liquid filtration filter.

Inventors:
FUCHIGAMI SHINICHIROU
Application Number:
PCT/JP2014/003524
Publication Date:
January 22, 2015
Filing Date:
July 02, 2014
Export Citation:
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Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
B01D19/02; B01D41/04; B08B3/08; H01L21/027; H01L21/304
Foreign References:
JP2001353424A2001-12-25
JP2005251936A2005-09-15
JPH06310487A1994-11-04
JP2007266477A2007-10-11
JPH1079369A1998-03-24
JPS6276624A1987-04-08
JPS6323326A1988-01-30
JPS63294989A1988-12-01
Attorney, Agent or Firm:
HIROKOH, MASAKI (JP)
Hiroyuki Masaki (JP)
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