Title:
CLEANING DEVICE AND VALVE DEVICE EQUIPPED WITH SAME
Document Type and Number:
WIPO Patent Application WO/2021/019926
Kind Code:
A1
Abstract:
A cleaning device (4) is equipped with a cleaning mechanism (5) that removes foreign matter in a subject location in a flow passage, and a determination device (6) that determines an operation of the cleaning mechanism (5). The cleaning mechanism (5) has a deformation member (51) that is arranged at a position exposed to fluid flowing through the flow passage and is deformed by a change in temperature, and a cleaning member (52) that advances toward and retreats from the subject location in response to deformation of the deformation member (51), thereby removing foreign matter from the subject location. The determination device (6) has a magnet (61) that is displaced in conjunction with the cleaning member (52), a magnetic sensor (62) that detects the magnetic field of the magnet (61), and a determination unit (64) that determines the operation of the cleaning mechanism (5) on the basis of the detection result of the magnetic sensor (62).
Inventors:
HAGIHARA KAZUNARI (JP)
Application Number:
PCT/JP2020/023027
Publication Date:
February 04, 2021
Filing Date:
June 11, 2020
Export Citation:
Assignee:
TLV CO LTD (JP)
International Classes:
F16K51/00; F16T1/00
Foreign References:
| JP2017190836A | 2017-10-19 | |||
| JP2019002491A | 2019-01-10 |
Attorney, Agent or Firm:
TERAZONO Kenichi et al. (JP)
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