BASE FOR PHOTOSENSITIVE DRUM AND PHOTOSENSITIVE DRUM

Title:

BASE FOR PHOTOSENSITIVE DRUM AND PHOTOSENSITIVE DRUM

Document Type and Number:

WIPO Patent Application WO/2004/104709

Kind Code:

A1

Abstract:

A cylindrical base for a photosensitive drum composed of a conductive resin composition containing a resin base material and a conductive material mainly containing carbon black, on which base a solvent-using photosensitive layer is directly formed, is characterized in that the resin base material mainly contains a mixed rein wherein (A) a polyester resin and (B) a polycarbonate resin is blended at a ratio (mass ratio) of (A)/(B) = 50/50-90/10. The base for a photosensitive drum is excellent in chemical resistance, formability, dimensional accuracy, and adhesion to the photosensitive layer, while being excellent in dimensional stability. A photosensitive drum using such a base exhibits good printing performance and excellent durability.

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Inventors:

SUZUKI TAKAHIRO (JP)
MACHIDA KUNIO (JP)
NISHIMURO YOUICHI (JP)

Application Number:

PCT/JP2004/007204

Publication Date:

December 02, 2004

Filing Date:

May 20, 2004

Export Citation:

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Assignee:

BRIDGESTONE CORP (JP)
SUZUKI TAKAHIRO (JP)
MACHIDA KUNIO (JP)
NISHIMURO YOUICHI (JP)

International Classes:

G03G5/10; (IPC1-7): G03G5/10

Foreign References:

JP2003005538A	2003-01-08
JP2001282011A	2001-10-12
JP2002372795A	2002-12-26
JPH04159560A	1992-06-02

Other References: