Title:
AU SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2024/084878
Kind Code:
A1
Abstract:
The sputtering surface of this Au sputtering target has: surface roughness Ra with an average value of 0.1-50.0 μm, wherein the difference between the maximum value and the minimum value is 10.0 μm or less; and surface roughness Rz with an average value of 80.0 μm or less, wherein the difference between the maximum value and the minimum value is 10.0 μm or less.
Inventors:
ITO TAICHI (JP)
Application Number:
PCT/JP2023/033946
Publication Date:
April 25, 2024
Filing Date:
September 19, 2023
Export Citation:
Assignee:
MATSUDA SANGYO COMPANY LTD (JP)
International Classes:
C23C14/34
Domestic Patent References:
| WO2022038796A1 | 2022-02-24 | |||
| WO2019111945A1 | 2019-06-13 |
Foreign References:
| JP2022128463A | 2022-09-01 | |||
| CN104561639A | 2015-04-29 | |||
| JP2009191323A | 2009-08-27 |
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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