Title:
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2000/074124
Kind Code:
A1
Abstract:
An epitaxial growth device (1) comprises a wafer guide (8) including a path (7) communicating with a wafer entrance (5) of a process chamber (2), and a door mechanism (9) for opening and closing the path (7). The door mechanism (9) comprises a door (10) having a body (12) with an annular groove (13) for receiving an O-ring (14), and a cylinder (11) for driving the door (10). The surface (12a) of the body (12) has a rounded edge (15) outside the outer part (13f) of the annular groove (13), so that the edge of the body (12) does not touch the wafer guide (8) when the door (10) is closed.
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Inventors:
SAITO KAZUYOSHI (JP)
TAKAGI YOUJI (JP)
TAKAGI YOUJI (JP)
Application Number:
PCT/JP2000/003409
Publication Date:
December 07, 2000
Filing Date:
May 26, 2000
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
SAITO KAZUYOSHI (JP)
TAKAGI YOUJI (JP)
SAITO KAZUYOSHI (JP)
TAKAGI YOUJI (JP)
International Classes:
H01L21/677; B65G49/00; C23C16/54; C30B25/08; C30B35/00; F16K51/02; H01L21/00; H01L21/205; (IPC1-7): H01L21/205; F16K51/02; H01L21/3065
Foreign References:
| EP0173115A2 | 1986-03-05 | |||
| JPH03114687U | 1991-11-26 | |||
| JP2000114179A | 2000-04-21 |
Attorney, Agent or Firm:
Hasegawa, Yoshiki (Ginza 2-chome Chuo-ku Tokyo, JP)
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