ANTIREFLECTION FILM AND METHOD FOR PRODUCING ANTIREFLECTION FILM

Title:

ANTIREFLECTION FILM AND METHOD FOR PRODUCING ANTIREFLECTION FILM

Document Type and Number:

WIPO Patent Application WO/2024/075804

Kind Code:

A1

Abstract:

The present invention provides: an antireflection film which has high antireflection properties and excellent scratch resistance; and a method for producing such an antireflection film.　This antireflection film 10 comprises a base material film 12, a hard coating layer 14 that is formed on the surface of the base material film 12, a high refractive index layer 16 that is formed on the surface of the hard coating layer 14, and a low refractive index layer 18 that is formed on the surface of the high refractive index layer 16; the high refractive index layer 16 is configured from a cured product of an ionizing radiation curable composition containing a (meth)acrylate compound that has a reactive group and titanium oxide particles that are surface-treated with a silane coupling agent having a reactive group that is capable of forming a bond with a (meth)acrylate compound; and the average particle diameter D50 of the titanium oxide particles in the volume-based cumulative particle size distribution is 20 nm or more, while the 90% particle diameter D90 of the titanium oxide particles in the volume-based cumulative particle size distribution is 120 nm or less.

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Inventors:

KATAOKA TAKESHI (JP)

Application Number:

PCT/JP2023/036308

Publication Date:

April 11, 2024

Filing Date:

October 05, 2023

Export Citation:

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Assignee:

HIGASHIYAMA FILM CO LTD (JP)

International Classes:

G02B1/111; B32B7/023; G02B1/14

Foreign References:

JP2005272270A	2005-10-06
JP2005338550A	2005-12-08
JP2004354828A	2004-12-16
JP2018128541A	2018-08-16
JP2011133867A	2011-07-07
JP2006072340A	2006-03-16
JP2005274696A	2005-10-06

Attorney, Agent or Firm:

WENO & PARTNERS (JP)

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