Title:
ALGORITHM FOR REAL-TIME PROCESS CONTROL OF ELECTRO-POLISHING
Document Type and Number:
WIPO Patent Application WO2004111314
Kind Code:
B1
Abstract:
Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the amount of charge removed for a bias substantially equals a respective target charge calculated for the bias.
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Inventors:
MANENS ANTOINE P (US)
DUBOUST ALAIN (US)
NEO SIEW S (US)
CHEN LIANG-YUH (US)
TSAI STAN D (US)
DUBOUST ALAIN (US)
NEO SIEW S (US)
CHEN LIANG-YUH (US)
TSAI STAN D (US)
Application Number:
PCT/US2004/007501
Publication Date:
July 07, 2005
Filing Date:
March 12, 2004
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
MANENS ANTOINE P (US)
DUBOUST ALAIN (US)
NEO SIEW S (US)
CHEN LIANG-YUH (US)
TSAI STAN D (US)
MANENS ANTOINE P (US)
DUBOUST ALAIN (US)
NEO SIEW S (US)
CHEN LIANG-YUH (US)
TSAI STAN D (US)
International Classes:
B23H5/06; B23H5/08; B24B37/013; B24B37/04; B24B49/04; B24B49/16; C25F3/02; C25F3/22; C25F3/30; C25F7/00; G01B7/06; H04N1/00; (IPC1-7): C25F3/30; B23H5/08; B24B37/04; C25F3/22; G01B7/06
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