Title:
イオン生成装置
Document Type and Number:
Japanese Patent JP7414602
Kind Code:
B2
Abstract:
There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.
Inventors:
Yuji Ishida
Application Number:
JP2020047762A
Publication Date:
January 16, 2024
Filing Date:
March 18, 2020
Export Citation:
Assignee:
Sumitomo Heavy Industries Ion Technology Co., Ltd.
International Classes:
H01J27/20
Domestic Patent References:
JP2012142248A | ||||
JP5082257A | ||||
JP56024739A | ||||
JP2003272555A |
Foreign References:
US5861630 | ||||
US5015862 |
Attorney, Agent or Firm:
Kenki Morishita
Teruo Tomisho
Teruo Tomisho