Title:
The constituent for metal electroplating containing the additive agent for bottom-up restoration of silicon penetration beer and an interconnection feature
Document Type and Number:
Japanese Patent JP6062425
Kind Code:
B2
Abstract:
A composition comprising a source of metal ions and at least one polyaminoamide, said polyaminoamide comprising amide and amine functional groups in the polymeric backbone and aromatic moieties attached to or located within said polymeric backbone.
Inventors:
Regel-Gepfeld, Cornelia
Marco Arnold
Flugel, alexander
Emnet, Charlotte
Later, roman benedict
Meyer, Dieter
Marco Arnold
Flugel, alexander
Emnet, Charlotte
Later, roman benedict
Meyer, Dieter
Application Number:
JP2014513298A
Publication Date:
January 18, 2017
Filing Date:
May 31, 2012
Export Citation:
Assignee:
BASF SE
International Classes:
C25D3/38; C08G69/26; C25D7/12; H01L21/28; H01L21/288
Domestic Patent References:
| JP2007107074A | ||||
| JP2004537626A | ||||
| JP2013512333A |
Attorney, Agent or Firm:
Satoshi Eto
Previous Patent: The crystal of 4- (3-benzyloxy phenylthio) -2-chloro 1- (3-nitroglycerine propyl) benzene
Next Patent: JPS6062426
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