Title:
WOVEN FABRIC FOR POLISHING MAGNETIC DISC
Document Type and Number:
Japanese Patent JP3693037
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a woven fabric for polishing a magnetic disc, enabling a polishing processing by which a more uniform and finer surface roughness Ra is provided to be carried out when carrying out texture processing of the magnetic disc.
SOLUTION: The woven fabric for polishing the magnetic disc is obtained by arranging filaments each with a multilobal cross section mainly as the weft on the surface. As a result, the magnetic disc substrate having the uniform small roughness Ra of ≤10 &angst is obtained by the slurry taken into the groove parts of the filaments with the multilobal sections and spaces formed by the multilobal filaments by arranging the many multifilament yarns comprising the filaments having the multilobal sections and substantially no torque as the wefts.
Inventors:
Kiyomura Etsuo
Wataru Abe
Takahashi
Wataru Abe
Takahashi
Application Number:
JP2002123690A
Publication Date:
September 07, 2005
Filing Date:
April 25, 2002
Export Citation:
Assignee:
TORAY INDUSTRIES,INC.
International Classes:
B24B1/00; B24B37/20; B24B37/24; D01D5/253; D03D1/00; D03D15/00; (IPC1-7): D03D1/00; B24B37/00; D03D15/00
Domestic Patent References:
JP2001179594A |
Foreign References:
WO2001061083A1 |
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