To provide a vapor deposition apparatus applicable to a large substrate and capable of obtaining a vapor-deposited film having a uniform film thickness, and a vapor deposition source used therefor.
A vapor deposition source 10 feeds a vapor deposition substance m substantially in a horizontal direction from a plurality of openings 10A arranged in a line. The vapor deposition source 10 comprises a feed end 11 having the plurality of openings 10A, a raw material feed source 12 for storing and vaporizing the vapor deposition substance m, and a feed pipe 13 for connecting the raw material feed source 12 to the feed end 11 and conveying the vaporized vapor deposition substance m to the feed end 11. The feed pipe 13 is connected to the feed end 11 while at least the feed end 11 side is branched into a plurality of parts, and a flow rate control means 17 is provided on each of the plurality of branched feed pipes 13a. The vapor deposition has the vapor deposition source.
COPYRIGHT: (C)2008,JPO&INPIT
UETAKE YUKI
MATSUMOTO HISAKI
TSUCHIYA TAKASHI
SAITO AKIRA
