PURPOSE: To form a lens excellent in chemical resistance, etc., by incorporating an alkali-soluble resin, photosensitive agent comprising naphthoquinonediazido sulfonate, specified alicyclic epoxy thermosetting agent, and solvent.
CONSTITUTION: This compsn. contains an alkali-soluble resin, photosensitive agent comprising 1,2,-naphthoquinonediazido sulfonate, thermosetting agent comprising a tetra-or higher functional alicyclic epoxy compd., and solvent. The alkali-soluble resin consists of, preferably, sturctural units expressed by formula or II. In formula I, II, R1 is a hydrogen atom or methyl group, R2 and R2 are hydrogen atoms, methyl groups, chlorine etc., A reprents OA1 (wherein A1 is hydrogen or alkyl group of 1-6 cardon number), k, m, z are intergers >1, and 1, n, x, y are integers including 0. By this method, a resist pattern with high sensitivity and high resolution can be obtd., and a lens having large refractive index, excellent transparency in a visible region, heat resistnace and chemical resistance can be obtd.
KAMIMURA TERUHISA
HASEGAWA MASAZUMI
