Title:
SUBSTRATE PROCESSING APPARATUS AND SUPPLY VALVE
Document Type and Number:
Japanese Patent JP2022138462
Kind Code:
A
Abstract:
To provide a substrate processing apparatus and a supply valve that can eliminate air bubbles caused by open/close valves.SOLUTION: A supply valve 21 has a configuration (open/close valve chamber 65, valve seat 71, diaphragm 73, and open/close drive 75) that functions as an open/close valve 55. The open/close valve chamber 65 is connected to a vent flow path 103 that discharges air bubbles in the open/close valve chamber 65. As a result, even if air bubbles are generated when the open/close valve 55 is opened/closed, the air bubbles in the open/close valve chamber 65 can be discharged through the vent flow path 103. Therefore, product defects due to air bubbles being supplied onto the substrate or the like can be prevented.SELECTED DRAWING: Figure 4
Inventors:
KASHIWAYAMA MASATO
Application Number:
JP2021038356A
Publication Date:
September 26, 2022
Filing Date:
March 10, 2021
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/027; B05C5/00; B05C11/10; F16K51/00
Attorney, Agent or Firm:
Tsutomu Sugitani
Hiroyuki Todaka
Tomohiko Sugiya
Kurihara Kaname
Nobuyoshi Aono
Hiroyuki Todaka
Tomohiko Sugiya
Kurihara Kaname
Nobuyoshi Aono