Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7155801
Kind Code:
B2
Abstract:
The present invention relates to a salt and an acid generator comprising the same, a photoresist composition, and a process for producing a photoresist pattern. The salt comprising a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, and X1 represents a C1-C12 saturated hydrocarbon group which has a moiety represented by formula (1a) or formula (2a): In formula (1a) and formula (2a), the definition of each substituents is the same as the detail description of the specification.
Inventors:
Tatsuro Masuyama
Yamamoto Satoshi
Koji Ichikawa
Yamamoto Satoshi
Koji Ichikawa
Application Number:
JP2018176976A
Publication Date:
October 19, 2022
Filing Date:
September 21, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D319/08; C07D327/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2011037837A | ||||
| JP2015157801A | ||||
| JP2016047815A | ||||
| JP2016204370A | ||||
| JP2012229206A | ||||
| JP2017155038A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto