To obtain a simple and small configuration of an apparatus that hardly gives discomfort to an operator by odor of vapor gas of a process liquid.

A vapor gas of a process liquid discharged from a closed space 9 formed by process tanks 1a to 1f and a shield plate 2 through a gas discharge pipe 4 is introduced to a liquid pipe 3 where a liquid to control temperature of the process liquid in the process tanks 1a to 1f flows. The odorous component of the vapor gas is removed in the liquid pipe 3 and the gas is discharged out of the apparatus through a gas discharge pipe 6.