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Title:
光触媒部材
Document Type and Number:
Japanese Patent JP5128084
Kind Code:
B2
Abstract:

To provide a photocatalyst member excellent in surface friction fastness, in particular, in wiping resistance so that the surface is hardly damaged and photocatalyst particles hardly separate from the surface.

The photocatalyst member A is made by making a photocatalyst layer 3 overlie the surface of a substrate 1 and further making a curable resin layer 4 having a thickness of 10-500 nm overlie the surface of the photocatalyst layer 3. Because the photocatalyst layer 3 is protected by the curable resin layer 4, the friction fastness, in particular, wiping resistance of the photocatalyst member A is enhanced, and anti-scratch property is enhanced. Because the curable resin layer 4 has a thin thickness of 10-500 nm, radical species and active oxygen species produced by activation of the photocatalyst particles in the photocatalyst layer 3 by light permeating through the curable resin layer 4 are scattered through the curable resin layer 4 to the front face side to decompose a malodor component and an organic substance of a low molecular weight and demonstrate antibacterial/antifungal actions.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Seiko Motoda
Takaki Suzuki
Atsushi Sakauchi
Hanzawa Masaru
Makoto Ihira
Application Number:
JP2006123588A
Publication Date:
January 23, 2013
Filing Date:
April 27, 2006
Export Citation:
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Assignee:
Takiron Co., Ltd.
International Classes:
B32B7/10; B01J33/00; B01J35/02; B32B27/04
Domestic Patent References:
JP2003015286A
JP2003071967A
JP2001239607A
JP2005138059A
JP2002225191A
JP2005212446A
Foreign References:
WO2006008251A1
Attorney, Agent or Firm:
河▲崎▼ 眞樹



 
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