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Title:
ポリ(ヒドロキシアリーレン)ポリマー樹脂を用いた他のアルカリ金属を含む産業流出液からのセシウムの分離方法
Document Type and Number:
Japanese Patent JP3853361
Kind Code:
B2
Abstract:
A method for the removal separation, and concentration of cesium cations from a source solution which may contain larger concentrations of other alkali metal ions comprises bringing the source solution into contact with a polymeric resin containing poly(hydroxyarylene) ligands. The poly(hydroxyarylene) ligand portion(s) of the polymeric resins has affinity for cesium, thereby removing cesium from the source solution. The source solutions from which the cesium has been removed may then be treated or disposed of as desired and the cesium cations are then removed from the polymeric resin through contact with a much smaller volume of a receiving solution in which these cesium cations are soluble and has greater affinity for such cations than does the poly(hydroxyarylene) ligand or protonates the ligand, thereby quantitatively stripping the complexed cesium cations from the ligand and recovering them in concentrated form in said receiving solution. The concentrated cesium cations thus removed may be further separated and recovered by known methods. The process is useful in the removal of cesium cations from a variety of source solutions such as from semiconductor, nuclear waste cleanup, metals refining, electric power, and other industrial enterprises. The invention is also drawn to the poly(hydroxyarylene)-ligand-containing polymeric resins.

Inventors:
Turbet, Brion Jay
Mars, Gallen
Cracowiak, Kruzystoff
Bruning, Ronald El
Application Number:
JP51544296A
Publication Date:
December 06, 2006
Filing Date:
November 02, 1995
Export Citation:
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Assignee:
IBC Advanced Technologies, Inc.
International Classes:
B01D15/00; B01J20/32; B01J39/04; B01J39/18; B01J45/00; C01D17/00; C08G8/04; C08G8/10; C08G8/12; C08G8/20; C08G14/02; C08G14/04; C22B3/26; C22B26/10; G21F9/12; C07C39/15
Domestic Patent References:
JP4342735A
JP5271149A
JP4128253A
Attorney, Agent or Firm:
Kazuo Shamoto
Shosuke Imai
Tadashi Masui
Tadahiko Kurita
Yasushi Kobayashi
Kiyoshi Murakami