Title:
クロム層又はクロム合金層を析出させるための方法及びめっき装置
Document Type and Number:
Japanese Patent JP7154415
Kind Code:
B2
Abstract:
A method for depositing a chromium or chromium alloy layer on at least one substrate, the method comprising the steps (a) providing an aqueous deposition bath with a pH in the range from 4.1 to 6.9, the bath comprising trivalent chromium ions, formate ions, and optionally sulfate ions, (b) providing the at least one substrate and at least one anode, (c) immersing the at least one substrate in the aqueous deposition bath and applying an electrical current such that the chromium or chromium alloy layer is deposited on the substrate, the substrate being the cathode, wherein, if during or after step (c) the trivalent chromium ions have a concentration below a target concentration of trivalent chromium ions, then (d) adding dissolved trivalent chromium formate to the aqueous deposition bath such that trivalent chromium ions are present in a higher concentration than before step (d), with the proviso that solid trivalent chromium formate is dissolved in a separated partial volume taken from the aqueous deposition bath to obtain said dissolved trivalent chromium formate for step (d).
Inventors:
Michael Muig
Anke Walter
Matthias Lost
Zebastian Kune
Anke Walter
Matthias Lost
Zebastian Kune
Application Number:
JP2021533264A
Publication Date:
October 17, 2022
Filing Date:
December 11, 2019
Export Citation:
Assignee:
Atotech Deutschland Game M Behaunt Coker Game
International Classes:
C25D3/06; C25D9/08; C25D21/02; C25D21/12; C25D21/14
Domestic Patent References:
| JP2009249707A | ||||
| JP2009532580A | ||||
| JP2017503926A | ||||
| JP2016108593A |
Foreign References:
| WO2018185144A1 |
Attorney, Agent or Firm:
Murayama Yasuhiko
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe