METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR TRANSFERRING PATTERN, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

Japanese Patent JP2015106001

A

PROBLEM TO BE SOLVED: To manufacture a photomask having a fine and high-definition transfer pattern.SOLUTION: A method for manufacturing a photomask is provided, which includes: a step of preparing a photomask blank having an underlay film, an overlay film, and a photoresist film formed on a transparent substrate; a step of forming a first resist pattern by subjecting the photoresist film to drawing and preliminary development; a preliminary etching step of preliminarily etching the overlay film by using the first resist pattern as a mask; an underlay film patterning step of etching the underlay film by using the first resist pattern or an overlay film pattern formed by the preliminary etching as a mask; an additional developing step of forming a second resist pattern by subjecting the first resist pattern to additional development; an overlay film patterning step of subjecting the overlay film to additional etching by using the second resist pattern as a mask; and a peeling step of peeling the second resist pattern.

YAMAGUCHI NOBORU

JP2013247218A

June 08, 2015

November 29, 2013

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HOYA CORP

G03F1/32; G03F1/80

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JP2010049247A	2010-03-04
JP2013235037A	2013-11-21
JP2011215614A	2011-10-27

Patent business corporation Tsukuni
Hajime Tsukuni
Yasuo Yanagibashi
Keiko Ozawa
Akio Shibata
Takashi Ishioka

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