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Title:
凹凸パターンフイルムの製造方法
Document Type and Number:
Japanese Patent JP4747769
Kind Code:
B2
Abstract:

To provide a manufacturing method of an uneven pattern film with good flatness and with less spots when arranging a reflection preventing layer on a formed uneven pattern film by which a uniform uneven pattern can be obtained in continuous production.

In the manufacturing method of the uneven pattern film forming the uneven pattern on the transparent resin film using an emboss roll having unevenness in its surface, the transparent resin film comes in contact with a crown roll arranged in direct front of the emboss roll, thereafter an ultraviolet curing resin composition is introduced between the transparent resin film wound around the emboss roll and the emboss roll, ultraviolet light is irradiated to from the inside of the emboss roll, thereafter the ultraviolet cured resin layer on whose surface unevenness is formed is peeled from the emboss roll together with the transparent resin film.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
Takashi Murakami
Takeshi Tanaka
Toshiaki Shibue
Application Number:
JP2005290797A
Publication Date:
August 17, 2011
Filing Date:
October 04, 2005
Export Citation:
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Assignee:
Konica Minolta Opto Co., Ltd.
International Classes:
B29C59/04; B29C39/18; G02B5/02; B29L7/00; B29L11/00
Domestic Patent References:
JP2001347220A
JP2005234554A
JP2004341070A
JP7137054A
JP2004106376A
JP9067051A