Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4369217
Kind Code:
B2
Abstract:
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
Inventors:
Michael Cornelis Fan Bake
Levinus Pieter Wackel
Theodorus Hubertus Josephus Bishops
Yeron John Kels
Marc clone
Robertus Adrinus Maria Voltas
Adrinus Johannes Henriks Mars
Levinus Pieter Wackel
Theodorus Hubertus Josephus Bishops
Yeron John Kels
Marc clone
Robertus Adrinus Maria Voltas
Adrinus Johannes Henriks Mars
Application Number:
JP2003414495A
Publication Date:
November 18, 2009
Filing Date:
December 12, 2003
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; B08B7/00; G03F7/20
Domestic Patent References:
| JP2001118767A | ||||
| JP9259812A | ||||
| JP2002261001A | ||||
| JP2002015970A | ||||
| JP11224839A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki