Title:
偏光された光によるリソグラフィ印刷
Document Type and Number:
Japanese Patent JP4864932
Kind Code:
B2
Abstract:
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
Inventors:
Nabila Baba-Ari
Justin Kreuzer
Harry sewell
Justin Kreuzer
Harry sewell
Application Number:
JP2008111552A
Publication Date:
February 01, 2012
Filing Date:
April 22, 2008
Export Citation:
Assignee:
AS ML Holding N.V.
International Classes:
G02B19/00; H01L21/027; G03B27/54; G03B27/72; G03C5/00; G03F7/20; G03F9/00; G03F
Domestic Patent References:
| JP7094399A | ||||
| JP9160219A | ||||
| JP5090128A | ||||
| JP11191532A | ||||
| JP7122469A | ||||
| JP2006135346A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki