To prevent generation of deposit on an evaporator in a hydrogen supply device for reforming a reforming raw material evaporated to be gasified in the evaporator and supplying hydrogen to a hydrogen consumption device.
A supply source of the reforming raw material consisting of water, air and a reforming fuel is divided into a 1st reforming raw material supply part 10 for supplying a 1st reforming raw material containing at least water and a 2nd reforming raw material supply part 30 for supplying a 2nd reforming raw material containing at least a hydrogen compound. The 2nd reforming raw material supply part 30 is arranged in the downstream side of a heat exchanger 20. Only the 1st reforming raw material is heated and gasified in the heat exchange part 20 and the 2nd reforming raw material is mixed with the 1st reforming raw material in the downstream side of the heat exchange part 20 and gasified.
KAWAGUCHI SEIJI
TERAO MASAYOSHI
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