Title:
かぶり効果を減少させるための方法
Document Type and Number:
Japanese Patent JP4871535
Kind Code:
B2
Abstract:
Method for reducing the fogging effect in an electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing which are conform to design data. A model for the fogging effect is fitted by individually changing at least the basic input parameters of the control function, the function type is chosen in accordance to the Kernel type used in the proximity corrector. The proximity effect is considered as well and an optimised set of parameters is obtained in order to gain a common control function for the proximity and fogging effect. The pattern writing with an e-beam lithographic system is controlled by the single combined proximity effect control function and the fogging effect control function in only one data-processing step using the same algorithms as are implemented in a standard proximity corrector.
Inventors:
Peter Fudek
Dirk Buyer
Remke Melchior
Dirk Buyer
Remke Melchior
Application Number:
JP2005188342A
Publication Date:
February 08, 2012
Filing Date:
June 28, 2005
Export Citation:
Assignee:
Vistec Electron Beam Game Beamer
International Classes:
H01L21/027; G03C5/00; H01J37/317
Domestic Patent References:
| JP11204415A | ||||
| JP11274043A | ||||
| JP11260694A | ||||
| JP2005019780A | ||||
| JP63086518A | ||||
| JP63058829A | ||||
| JP61198630A | ||||
| JP61156813A | ||||
| JP2004140311A | ||||
| JP2003151885A | ||||
| JP2001244165A |
Attorney, Agent or Firm:
Fujita Akira