Title:
フィルタエレメント及び当該フィルタエレメントを製造するための方法
Document Type and Number:
Japanese Patent JP4917429
Kind Code:
B2
Abstract:
Production of a filter element involves applying a membrane layer to a substrate, etching a membrane chamber on the side of the substrate lying opposite the membrane layer so that a residual layer of the substrate remains, producing pores in the membrane layer using a lithographic and etching process to create a perforated membrane, and removing the residual layer by etching to expose the membrane layer. Production of a filter element involves applying a membrane layer (1) to a substrate (2), etching a membrane chamber (3) on the side of the substrate lying opposite the membrane layer so that a residual layer (5) of the substrate remains, producing pores (6) in the membrane layer using a lithographic and etching process to create a perforated membrane, and removing the residual layer by etching to expose the membrane layer. The membrane layer is additionally treated during the first step or in a later step to raise its mechanical strength. An independent claim is also included for a filter element produced by the above process.
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Inventors:
Hoffman Wilfried
Application Number:
JP2006518100A
Publication Date:
April 18, 2012
Filing Date:
July 03, 2004
Export Citation:
Assignee:
Enfte/Nanofilter Tehnik/Gezels Shaft/Mitt/Peshrenktel/Haftung
International Classes:
B01D69/12; B01D39/20; B01D67/00; B01D69/00; B01D69/02; B01D69/06; B01D69/10; B01D71/02; C04B38/04; C23C16/42
Domestic Patent References:
| JP2003514677A | ||||
| JP2003526497A |
Foreign References:
| US5753014 | ||||
| EP0879635A1 |
Attorney, Agent or Firm:
Akihiro Ryuka