Title:
FILM FORMATION METHOD AND ARTICLE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2023090491
Kind Code:
A
Abstract:
To provide a technique capable of making a substrate flat with preferable productivity.SOLUTION: A film formation method comprises: an arranging step of arranging discretely, a plurality of droplets of a liquid curable composition including at least, a polymerizable compound (a) as a nonvolatile component, and a solvent (d) as a volatile component, on a substrate comprising an irregularity; a standby step of waiting until, the droplets discretely arranged on the substrate are joined to the adjacent droplets respectively, for forming a continuous liquid film on the substrate, the solvent (d) included in the liquid film volatiles, and a content of the solvent (d) becomes 10 volume% or smaller with respect to the whole liquid film; and a curing step of curing the liquid curable composition. The substrate includes a plurality of regions where average altitudes are different each other, and an average liquid film thickness of the curable composition arranged on a certain region in the arranging step, is greater than an average liquid film thickness of the curable composition on the highest salient part region of the substrate by an offset amount.SELECTED DRAWING: Figure 1
Inventors:
KINO JUNPEI
ITO TOSHIKI
KIYOHARA NAOKI
ITO TOSHIKI
KIYOHARA NAOKI
Application Number:
JP2021205461A
Publication Date:
June 29, 2023
Filing Date:
December 17, 2021
Export Citation:
Assignee:
CANON KK
International Classes:
C09D201/00; B05D1/26; B05D3/00; B05D7/00; B05D7/24; H01L21/027
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office
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