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Title:
排ガスの処理方法および処理装置
Document Type and Number:
Japanese Patent JP4583880
Kind Code:
B2
Abstract:

To provide an exhaust gas treating method capable of preventing blocking of a pipe due to deposit adhering, an original purpose, preventing the pipe from being excessively heated, and preventing thinning and blocking of the pipe due to a reaction product by the pipe material and fluorine radicals, when introducing exhaust gas from a membrane forming system containing Si components, into an exhaust gas treating process.

In this exhaust gas treating method treating exhaust gas from a membrane forming system containing Si components, by the exhaust gas treating process 105, when introducing the exhaust gas into the exhaust gas treating process 105 through a pipe 103 by a vacuum pump 102, a check valve 104 is provided in the pipe 103, the pipe 103 is, at least between the vacuum pump 102 and exhaust gas treating process 105, is kept at a temperature preventing deposition of deposit from the exhaust gas by a heater 109, a heating means, and a heating temperature of the heater 109 is set to 130-180°C.

COPYRIGHT: (C)2006,JPO&NCIPI


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Inventors:
Masahiko Aiko
Akinori Yamada
Yoshito Masuda
Tokuda Takahiro
Hiroyuki Miyamoto
Application Number:
JP2004317689A
Publication Date:
November 17, 2010
Filing Date:
November 01, 2004
Export Citation:
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Assignee:
Panasonic Corporation
International Classes:
B01D53/46; B01D46/04; B01D50/00; B01D51/00; F23G7/06
Domestic Patent References:
JP2003021315A
JP5192534A
JP2102194A
JP11057390A
Attorney, Agent or Firm:
Ikeuchi, Sato & Partners



 
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