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Title:
DIAPHRAGM AND CHEMICAL CONTROL DEVICE
Document Type and Number:
Japanese Patent JP2023090629
Kind Code:
A
Abstract:
To provide a diaphragm which is applied to a chemical control device and enables reduction of minute air bubbles contained in a chemical.SOLUTION: A diaphragm (30) is applied to a chemical control device, which controls circulation of a chemical used in a semiconductor manufacturing process, and compressed by an operative gas and includes: a film part (31) which is formed by a fluorine resin having tolerance to the chemical; and a penetration inhibition layer (42) which is provided on a surface (31b) of the side compressed by the operative gas of the film part and in which it is more difficult for the operative gas to penetrate than in the film part.SELECTED DRAWING: Figure 3

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Inventors:
YOSHIDA MASATERU
NISHIO YOSHIFUMI
KUMAGAI TAKAYUKI
NISHIDA SHIGENOBU
Application Number:
JP2022167532A
Publication Date:
June 29, 2023
Filing Date:
October 19, 2022
Export Citation:
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Assignee:
CKD CORP
International Classes:
F16J3/02; B32B27/30; F16K7/02
Attorney, Agent or Firm:
Tsuyoshi Yamada
Hiroshi Matsuda



 
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