PURPOSE: To produce ultrapure water contg. the smallest amt. of impurities by directly connecting devices in the secondary treating system consisting of an UV sterilizer, an ion-exchange device, an ultrafilter, etc., in the title high- purity water producing device to eliminate the retention of water in a pipeline.
CONSTITUTION: The UV sterilizer 10, ion-exchange device 20, and ultrafilter 30 constituting the secondary treating system are connected preferably in this order at the shortest distance from each other. For example, a device consisting of a flocculating and settling tank 1, a filter 2, a reverse-osmosis device 3, and an ion-exchange resin tower 4 is set on the outside of a clean room in the high-purity water producing device of a semiconductor producing factory. In addition, the directly connected devices of the secondary treating system are dispersedly set in the clean room, and the water is introduced to the point of use from the room and used. Accordingly, the elution from a pipeline system, generation and propagation of microbes, generation of fine particles, etc., can be prevented, and ultrapure water contg. the smallest amt. of impurities can be produced.
KOSEKI YASUO
KUROKAWA HIDEAKI
EBARA KATSUYA
TAKAHASHI SANKICHI
HAYASHI NOBUATSU
YODA HIROAKI
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