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WO/2019/097197A1 |
The invention relates to a system for generating a spatially localised, high-intensity laser beam, comprising: a laser source (80) designed to generate a burst of N laser pulses with a duration of less than or equal to one picosecond, th...
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WO/2019/092831A1 |
Provided is an extreme ultraviolet light generation device which generates plasma by irradiating a target material with pulsed laser light, thereby generating extreme ultraviolet light, the extreme ultraviolet light generation device com...
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WO/2019/086397A1 |
A method is described to clean a surface of an optic (115) within a chamber (125) of an extreme ultraviolet (EUV) light source (100). The chamber is held at a pressure below atmospheric pressure. The method includes generating a material...
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WO/2019/081364A1 |
An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a s...
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WO/2019/081105A1 |
An apparatus for receiving a conductive fuel comprises: a body; a current generating mechanism; and a magnet generating mechanism. The body defines a surface for receiving fuel. The current generating mechanism is suitable for generating...
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WO/2019/078079A1 |
Provided is a mechanism for accurately calculating the spectrum of radiation. This radiation imaging device is designed to image an object of interest using radiation, and is provided with a radiation generation unit for generating radia...
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WO/2019/079543A1 |
Systems, devices, and methods to accurately and precisely align a visualized axis with one or more objects in an image field during a procedure using an imager based positioner system attached to an electronic positioning device are desc...
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WO/2019/057584A1 |
A radiation source configured to provide EUV radiation, the radiation source comprises a fuel emitter and a laser system. The fuel emitter is configured to provide a fuel target to a plasma formation region. The laser system is configure...
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WO/2019/058430A1 |
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror that is situated inside the chamber, that has a reflecting surface for establishing a first focal point and a second focal point...
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WO/2019/057409A1 |
A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the pl...
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WO/2019/058708A1 |
This radiation image capturing system comprises: an image capturing unit that includes a plurality of pixels for generating a radiation image and a detecting unit that detects incident radiation in order to perform exposure control; an i...
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WO/2019/057514A1 |
A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with th...
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WO/2019/054540A1 |
The present invention relates to an apparatus capable of extracting multiple laser Compton scattering (LCS) photon beams by using an LCS reaction, comprising: a linear accelerator for accelerating an electron beam; and an LCS gamma ray g...
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WO/2019/043773A1 |
[Problem] To enable easy measurement of the film thickness of debris adhered to the surface of a component without the need for the extensive disassembly of the in-chamber component in an extreme ultraviolet light generator. [Solution] A...
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WO/2019/042587A2 |
The invention relates to a control device for an X-ray tube (2), comprising a housing (29) that is designed as a shield, in which an anode current regulating unit (1) is arranged and which is connected to a cathode power supply unit (18)...
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WO/2019/046417A1 |
Methods and systems for x-ray based semiconductor metrology utilizing a clean, hard X-ray illumination source are described herein. More specifically, a laser produced plasma light source generates high brightness, hard x-ray illuminatio...
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WO/2019/038103A1 |
A target material receptacle includes a structure including a passageway that extends in a first direction, the passageway configured to receive target material that travels along a target material path; and a deflector system configured...
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WO/2019/035165A1 |
An extreme ultraviolet light generation device of one aspect of the present disclosure, comprises: an optical base; and a chamber module configured to be interchangeable with respect to the optical base. The chamber module includes: a ch...
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WO/2019/025768A1 |
To achieve high quality x-ray imaging, it is important to be able to control the production of x-rays in an x-ray generator. This is achieved by an x-ray generator comprising an array of electron field emitters for producing paths of ele...
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WO/2019/028454A1 |
A transparent radiation shield, attachable to a patient support platform, and movable to shield a physician from imaging radiation, includes a transparent computer display that is controllable to provide a data overlay on the shield pert...
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WO/2019/019042A1 |
An X-ray source (201, 1201, 1301, 1401, 1501, 1601, 1701), comprising: a cathode (212) in a recess (215) of a first substrate (210); a counter electrode (220) on a sidewall of the recess (215), configured to cause field emission of elect...
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WO/2019/008719A1 |
A laser system comprises: a pulse laser system that emits first laser light having a first wavelength component and a first polarized component and second laser light having the first wavelength component and a second polarized component...
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WO/2019/003284A1 |
An extreme ultraviolet light generation device comprises: a chamber that focuses laser light in the inner space to plasmatize a target substance at the focal point of laser light; a collector mirror that collects extreme ultraviolet ligh...
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WO/2018/234224A2 |
An X-ray source (100) is disclosed, comprising a liquid target source (110) configured to provide a liquid target (J) passing through an interaction region (I). The X-ray source further comprises an electron source (120) configured to pr...
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WO/2018/234260A1 |
A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including ...
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WO/2018/234061A1 |
A radiation source (SO) comprising: • a fuel supply device (3) configured to supply fuel; • an excitation device (1) configured to excite the fuel into a plasma (7); • a collector (5) configured to collect radiation emitted by the ...
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WO/2018/229424A1 |
The invention relates to a discharge nozzle configured to project a fluid in the form of a convergent spray. To this end, the invention proposes a discharge nozzle (100) comprising a nozzle body (110) defining a passage (112) between an ...
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WO/2018/232037A1 |
For radiation safety, a fluoroscope has an adjustable X-ray source-to-intensifier distance (SID) and an X-ray transparent spacer positioned between the source and receptor. As a distance between the source and the intensifier is changed,...
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WO/2018/229855A1 |
This extreme ultraviolet light generation device is provided with: (A) a chamber for generating extreme ultraviolet light by bringing a target material into a plasma state by irradiating the target material with laser light; (B) a vessel...
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WO/2018/229838A1 |
The extreme ultraviolet light sensor unit relating to one aspect of the present disclosure is provided with: a mirror that reflects extreme ultraviolet light; a wavelength filter that selectively passes extreme ultraviolet light reflecte...
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WO/2018/225307A1 |
An X-ray generation device is provided with: an X-ray tube including an electron gun which generates an electron beam and a target which generates an X-ray due to the entry of the electron beam; a power supply unit including a booster un...
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WO/2018/224369A1 |
The present invention relates to an apparatus (10) for generating X-rays. It is described to produce (210) with at least one power supply (40) a voltage between a cathode (20) and an anode (30). The cathode is positioned relative to the ...
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WO/2018/220761A1 |
An extreme UV light generation system may comprise: a first area that includes a light path adjustment unit that adjusts the light path of laser light emitted from an oscillator; a second area that includes a chamber having a plasma gene...
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WO/2018/219578A1 |
A radiation source comprising a fuel emitter configured to provide droplets of fuel to a plasma formation region; and a laser system configured to supply a laser beam; wherein the laser system comprises a delay line configured to delay a...
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WO/2018/213867A1 |
A device and method for creating controlled radio frequency (RF) modulated X-ray radiation is described. The device includes an anode housed within a vacuum enclosure which acts to accelerate and convert an electron beam into X-ray radia...
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WO/2018/216266A1 |
An X-ray control circuit adjusts the frequency of alternating-current power converted by an inverter in such a way that a tube voltage value detected by a tube voltage detector matches a preset target tube voltage value. With a storage b...
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WO/2018/211551A1 |
This target measuring device is provided with: a photographing unit (80) that photographs an image of a target outputted from a target supply unit; a moving unit (82) that moves at least a part of the photographing unit; and a control un...
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WO/2018/211569A1 |
An extreme ultraviolet light generation device comprises: a chamber (2) that includes therein a plasma generation region (22) for forming a plasma from the droplets of a target substance; an EUV-light collector mirror (23) that has a ref...
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WO/2018/213794A1 |
According to some aspects, a carrier configured for use with a broadband x-ray source comprising an electron source and a primary target arranged to receive electrons from the electron source to produce broadband x-ray radiation in respo...
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WO/2018/208388A1 |
Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be insta...
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WO/2018/207413A1 |
The current value of a target current (A) detected by a target current detection unit (22), and the current value of an emission current (B) detected by an emission current detection unit (23) are compared with each other by a second com...
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WO/2018/203369A1 |
An extreme ultraviolet light generation apparatus according to one aspect of the present invention is provided with: a chamber in which extreme ultraviolet light is generated when tin is irradiated with a laser beam; a hydrogen gas suppl...
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WO/2018/203370A1 |
A target supply device according to one aspect of the present disclosure comprising a vibration element that applies vibration to a target substance outputted from a nozzle 80 so that droplets are formed, a droplet detection unit that de...
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WO/2018/195089A1 |
A control mechanism for a high-voltage generator for supplying voltage and current to an electronic radiation source in high-temperature environments is provided, the control mechanism including at least one voltage feedback loop for mon...
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WO/2018/184554A1 |
Provided are an x-ray tube device and a spring pin (404) for use in an x-ray tube device. The x-ray tube device comprises: an outer tubular assembly (10) having an anode end (120) and a cathode end (130); an anode end cover assembly (20)...
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WO/2018/179417A1 |
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror positioned inside of the chamber; and a hydrogen gas discharge section positioned inside of the chamber, said hydrogen gas disch...
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WO/2018/179068A1 |
An EUV light generation device 1 comprises: a plurality of EUV light sensors that measures, from mutually differing directions, the energy of EUV light generated by irradiating laser light on a target 27 supplied in a prescribed region i...
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WO/2018/177768A1 |
The invention describes a method and a device for creating a phase modulated ultrashort laser pulse (12), comprising the following steps: - an initial ultrashort laser pulse (1) is split into a first laser pulse (3) and a second laser pu...
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WO/2018/172012A1 |
A lithographic system (100) comprises an EUV radiation source for generating EUV radiation; and a lithographic scanning apparatus that uses the EUV radiation for illuminating a pattern to image the pattern onto a substrate; and control s...
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WO/2018/175023A1 |
A system for an EUV light source includes a metrology light source configured to emit a metrology light beam; and an optical beam combiner positioned to receive the metrology light beam and at least one other light beam and to direct the...
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