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WO/2024/111614A1 |
The present invention relates to a water repellent composition which contains a non-fluorine polymer that has a constituent unit derived from a long-chain alkyl (meth)acrylate monomer, a constituent unit derived from a vinyl halide monom...
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WO/2024/112735A1 |
The disclosure relates to fixed-abrasive grinding plates, fixed-abrasive grinding tools formed therefrom, and related methods. The grinding plate generally has a composite structure with abrasive beads (e.g., beads with diamond abrasives...
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WO/2024/112302A1 |
The invention relates to the vehicle glass cleaning fluid, which is used for glass cleaning of all vehicles, does not contain flammable and combustible alcohol, and does not freeze even if the air temperature drops to -55°C in winter co...
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WO/2024/112904A1 |
An abrasive article comprising: a body comprising abrasive grains contained within a bond material comprising a metal or metal alloy, wherein the body comprises a ratio, (VAG /VBM), of volume of abrasives (VAG) to volume of bond (VBM), o...
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WO/2024/111616A1 |
The present invention relates to a water-repelling agent composition which contains a non-fluorinated polymer having a constituent unit derived from a long chain alkyl (meth)acrylate monomer, a constituent unit derived from a vinyl halid...
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WO/2024/111611A1 |
The present invention relates to a water repellent composition comprising a fluorine-free polymer having a structural unit based on a long-chain alkyl (meth)acrylate monomer, a structural unit based on a halogenated vinyl monomer and a s...
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WO/2024/105890A1 |
Provided is a snow melting agent which contains at least one selected from the group consisting of sodium chloride, magnesium chloride, and calcium chloride as a major component, and an additive that causes generation of a sulfate ion an...
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WO/2024/106445A1 |
A composition for repairing liquid leakage which contains a (meth)acrylic compound having a weight-average molecular weight of 600 or greater and which is compatible, or a composition for repairing liquid leakage which has a storage modu...
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WO/2024/106140A1 |
[Problem] To provide an infrared radiation-absorbing material fine particle dispersion liquid and an infrared radiation-absorbing material fine particle dispersion which exhibit high transmittance of light in the visible light region, ab...
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WO/2024/106249A1 |
Provided is a polishing composition that is capable of suppressing the generation of an agglomerated powder of abrasive grains, has excellent abrasive grain dispersibility, and is capable of producing a smooth surface having high smoothn...
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WO/2024/106818A1 |
The present invention relates to carbon black having improved stability and biocompatibility, a method for preparing same, and uses thereof. More specifically, the present invention relates to carbon black coated with pluronic polymers, ...
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WO/2024/103246A1 |
The present invention provides a polymer structure and a use thereof. The polymer structure comprises a substrate and a light shielding layer covering at least part of the surface of the substrate; the substrate comprises a first polymer...
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WO/2024/106338A1 |
According to one aspect of the present disclosure, provided is a polishing liquid composition capable of reducing silica residues and scratches on a substrate surface after polishing. In one aspect, the present disclosure pertains to a...
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WO/2024/106131A1 |
Provided is a shedding film which is formed from a tetraalkoxysilane (B) and an alkyltrialkoxysilane (A) that has a C1-14 alkyl group.
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WO/2024/106537A1 |
A water-repellent film (11, 21) can be statically charged and is for use in electrostatic attraction, and has an angle of contact of 100° or more with respect to water, a relative permittivity of 2.0 or more, and a thickness of 50-2000 ...
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WO/2024/106476A1 |
A photocurable composition for lithium ion secondary battery sealing materials according to the present invention contains, at a specific ratio, (A) a compound which has a skeleton of a polybutadiene and/or a hydrogenated polybutadiene, ...
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WO/2024/107316A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) a rutile titanium dioxide abrasive; (b) an organic polishing promoter comprising a carboxylic acid, a urea, an amine, a thiol, a hydroxyl, an amide, a sul...
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WO/2024/106139A1 |
[Problem] To provide an infrared-absorbing material fine particle dispersion liquid and dispersion that are highly transparent to light in the visible light range, have light-absorbing properties in the near-infrared range, and are adjus...
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WO/2024/101393A1 |
The present invention provides a repelling agent including a polymer selected from polymers (I)-(III), which are defined as follows. (I) A polymer having a repeat unit (1) that is represented by the formula –[CH2C(–Q1)C(=O)R1]– (wh...
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WO/2024/102293A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) silica abrasive; (b) an amine-based compound, wherein the amine-based compound comprises a carbon to nitrogen ratio of about 1:1 to about 3:1; (c) optiona...
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WO/2024/101396A1 |
The present invention provides a novel repellent agent which contains a liquid repellent compound that has an amine skeleton and one or more long-chain hydrocarbon-containing groups represented by formula -X-Rn (wherein the definition of...
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WO/2024/101871A1 |
An inorganic particle according to the present invention has a shape in which a plurality of spherical protrusions are formed on the surface of a spherical primary particle, and is composed of a mixture of amorphous and crystalline phase...
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WO/2024/101404A1 |
This fluorine atom containing silane compound is represented by formula (1). The symbols have the same meaning as described in the description. (1): (Rf1)α 1-XA-(RSi)α 2
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WO/2024/100964A1 |
Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, ...
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WO/2024/101242A1 |
Provided is, according to one embodiment, a polishing liquid composition having excellent dispersion stability and capable of both improving polishing speed and reducing post-polishing scratches on the substrate surfaces. The present d...
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WO/2024/102266A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive particle; (b) an ionic oxidizer; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 1 to about 7, the abra...
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WO/2024/095883A1 |
A modifier for a thermoplastic resin that contains a rosin resin having a mass residual rate after heating for two hours at 300°C of 40 mass% or more and a mixed methylcyclohexane aniline cloud point (MMAP) of from -10 to 20°C.
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WO/2024/096005A1 |
An electrochromic sheet (100) according to the present invention comprises: a first support layer (1); an electrolyte layer (4) provided on the first support layer (1); a first electrochromic layer (3) provided on at least one surface of...
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WO/2024/095880A1 |
Disclosed is a modifying agent for thermoplastic resins, the modifying agent containing a hydrogenated aromatic hydrocarbon resin that has a residual mass ratio of 65% by mass or more after being heated at 300°C for two hours, while hav...
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WO/2024/097974A1 |
The subject application relates to bonded abrasive with low wetting bond material. An abrasive article including a bonded abrasive body having a particular MOR/EMOD ratio associated with a particular bond vol%. The body also can include ...
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WO/2024/092856A1 |
The present invention relates to the technical field of biomedical materials, and particularly, to a super-hydrophobic self-cleaning anticoagulant composite coating material, a method for preparing same, and use thereof. In the provided ...
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WO/2024/096277A1 |
The present invention relates to a polishing slurry composition. An embodiment pertains to a polishing slurry composition for organic membrane polishing, the composition including: polishing particles containing metal-coated metal oxide;...
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WO/2024/095868A1 |
The present invention provides a resist composition which generates an acid by being exposed to light, and the solubility of which in a developer solution is changed by the action of an acid. This resist composition contains: a resin com...
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WO/2024/095878A1 |
This modifier for a thermoplastic resin comprises a hydrogenated aromatic hydrocarbon resin having a mass residual rate of at least 64 mass% after heating at 300ºC for 2 hours, and a mixed methylcyclohexane-aniline cloud point (MMAP) of...
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WO/2024/095948A1 |
A sealing agent comprising: a cationically polymerizable compound (A); a cationic polymerization initiator (B); and a curing retarder (X), wherein a viscosity change ratio represented by V1/V0 is not less than 1.00 but less than 1.75, wh...
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WO/2024/095652A1 |
Disclosed is a non-fluorine water-repellent composition that is capable of improving water repellency during actual use of various articles. A non-fluorine water-repellent composition according to the present disclosure contains: (A) at ...
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WO/2024/094856A1 |
The present invention relates to the use of a coating system as a very durable anti-slip coating of surfaces, in particular floors.
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WO/2024/094534A1 |
The invention relates to an abrasive element for an abrasive (15), in particular a flexible abrasive (15), preferably an abrasive disc, for abrading a workpiece with a main abrasive element (13). According to the invention, the abrasive ...
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WO/2024/095801A1 |
The present invention provides an amorphous carbon-metal iron composite that is safe and easy to handle, that maintains activity for a long period of time, and that is capable of sufficiently reducing organic halogen compounds contained ...
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WO/2024/091104A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristic of the present invention with a...
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WO/2024/091103A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristics of the present invention with ...
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WO/2024/091100A1 |
Provided are cerium oxide particles for chemical mechanical polishing and a chemical mechanical polishing slurry composition comprising same. A combination of the characteristic cerium oxide particles of the present invention with a dish...
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WO/2024/089919A1 |
This method selects a raw material for obtaining abrasive grains, wherein the raw material includes cerium, and the raw material is selected on the basis of an average value of the positron lifetime measured by positron annihilation spec...
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WO/2024/090423A1 |
The purpose of the present invention is to provide: a composition which contains a novel compound that has excellent handling properties; and a production method, use or the like of this composition. The present invention provides a (met...
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WO/2024/089923A1 |
Provided is a selection method for a raw material for obtaining abrasive grains, wherein the raw material contains cerium, and the raw material is selected on the basis of a peak top temperature in a differential curve of a thermogravime...
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WO/2024/091102A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a slurry composition for chemical-mechanical polishing comprising same. By means of a combination of cerium oxide particles, the characteristic of the present inve...
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WO/2024/089920A1 |
This method is for selecting abrasive grains containing cerium, and involves selecting the abrasive grains on the basis of the average positron lifetime as measured by a positron annihilation method. Abrasive grains according to the pres...
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WO/2024/089921A1 |
Provided is a selection method for abrasive grains, wherein the abrasive grains contain cerium and the abrasive grains are selected on the basis of the crystallite diameter thereof. Also provided are abrasive grains containing cerium and...
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WO/2024/091105A1 |
Provided are: cerium oxide particles for chemical mechanical polishing; and a slurry composition for chemical mechanical polishing comprising same. Provided are: a slurry composition for chemical mechanical polishing that can significant...
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WO/2024/091101A1 |
Provided are: chemical mechanical polishing cerium oxide particles; and a chemical mechanical polishing slurry composition containing same. Provided are the chemical mechanical polishing slurry composition and a method for manufacturing ...
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