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JPS6328883A |
PURPOSE: To prevent the plasma damage and to efficiently carry out uniform plasma treatment by pulling out the plasma in the form of a sheet, and positioning a substrate close to and in parallel with the plasma. CONSTITUTION: A plasma pr...
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JPS6316041A |
PURPOSE: To obtain an ultrafine/fine powder of a metal or ceramics having a good powder characteristic, by forcibly mixing gas containing an easily evaporative metal compound with reactive gas reacting with said gas at the beginning of a...
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JPS631388B2 |
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JPS634842A |
PURPOSE: To stabilize the vaporization and supply of a solid raw material and high-frequency plasma by monitoring the luminance of the raw material element, etc., through a spectral analysis means, and performing a specified control on t...
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JPS631445A |
PURPOSE: To impart uniform heat history to all of gases and hyperfine particles, by constituting an hyperfine particle preparing apparatus by providing a reaction pipe for allowing raw gases to flow and a means irradiating the interior o...
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JPS631440A |
PURPOSE: To prevent foreign matter from adhering to the back surface of a wafer by preventing the adhesion of oxide flakes, by applying a polysilicon membrane to the surface contacted with the wafer of a wafer mount stand, a wafer push-u...
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JPS62282636A |
PURPOSE: To produce the title high-purity ultra-fine powder with high productivity by allowing a base gas consisting of ≥50vol% diatomic molecule or polyatomic molecule to react with the gas of a metal or a metal halide while stably ge...
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JPS6254842B2 |
A minute metal powder is obtained by a method which comprises melting a metal, imparting ultrasonic vibration to the resulting melt, introducing an inert or reducing gas into the ultrasonically vibrated melt thereby producing minute bubb...
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JPS62250945A |
PURPOSE: To efficiently form fine particles having a new functional characteristic, by constituting a gaseous phase apparatus by arranging a plurality of treatment chambers along the flow passage of the downstream side of a nozzle ejecti...
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JPS6251674B2 |
PURPOSE:To efficiently perform catalytic heat decomposition reaction and to regenerated the catalyst for repeated use by contacting material to be decomposed such as polymers or N-containing organic compounds with a catalyst made of meta...
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JPS62247836A |
PURPOSE: To transfer a gas at an accurately controlled supersonic speed by providing a nozzle at the tip of an induction pipe for supplying a plasma forming gas, and furnishing an exciting means for exciting the gas in the induction pipe...
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JPS62227442A |
PURPOSE: To eliminate the adhesion of impurities to a microwave introducing window, by arranging a magnetic field generating means which applies a magnetic field to a plasma forming chamber in the axial direction thereof and first and se...
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JPS62213841A |
PURPOSE: To enhance the reactivity and heat efficiency of a reactive substance, by supplying a first reactive substance in the arc plasma flame generated in a torch while supplying a second reactive substance in the space provided to the...
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JPS62123243U |
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JPS62168542A |
PURPOSE: To easily form an ultrafine particulate compound, by a method wherein produced ultrafine particles of a stock material are moved to a plasma treatment area along with inert gas and subsequently reacted with reactive gas for form...
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JPS62152532A |
In a sealed enclosure 2, previously purged and kept at a slight overpressure, a reactive gas is passed through an annular plasma produced by a microwave torch 1; then, by means of gas jets 39, the reaction products are cooled on leaving ...
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JPS6229089B2 |
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JPS62132540A |
PURPOSE: To synthesize a polycrystal on many sheets by setting one or more of intermediate substrates which have a rectangular cross section and deposits the compd. thereon, in parallel to each other between two facing sheets, thereby im...
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JPS62501411A |
A catchment pack suitable for use in an ammonia oxidation reactor has a predetermined geometric shape and comprises two or more catchment pack segments (10) located in planar edge-to-edge relationship one with another, each of said catch...
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JPS62119107A |
PURPOSE: To purity high-purity metallic Si in excellent yield at low cost by utilizing a plasma arc discharge phenomenon and allowing a gaseous mixture of SiCl4 and H2 to react chemically to obtain liquid metallic Si and gaseous HCl. CON...
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JPS6223254B2 |
In a plasma chemical reaction carried out with at least one gas, the plasma constants in the progress of reaction such as electron temperature, electron density and electron energy distribution function can be measured by use of a probe ...
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JPS6279536U |
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JPS6299468A |
PURPOSE: To synthesize a ferromagnetic material contg. Fe8N excellent in the magnetic characteristics in high selectivity and high growth velocity by impressing electromagnetic wave energy in the decompression for two gaseous molecules c...
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JPS6217852B2 |
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JPS6257642A |
PURPOSE: To obtain pulverous particles which are uniform and are high in purity by evaporating and suspending metallic particles by an arc and carrier gas in a reactive element atmosphere to form a pulverous granular metallic compd., the...
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JPS62500290A |
(57) [Abstract] Since this gazette is application data in front of an electronic application, the data of an abstract is not recorded.
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JPS6223983A |
PURPOSE: To obtain a small-sized device capable of treating many substrates simultaneously by specifying the structure and function of the holding mechanisms of the substrates in the titled device which is provided with the holding mecha...
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JPS621538B2 |
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JPS621321B2 |
Process and apparatus are provided for preparing finely-divided silicon dioxide in good yield by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to...
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JPS62203B2 |
Fine powder of an alloy of two or more metals is made by vaporizing each of these metals in its own vaporization chamber, mixing each of the metallic vapors with an inert carrier gas, and then adiabatically expanding each of the mixture ...
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JPS61291044A |
A novel fixed-bed catalyst structure obtained using honeycomb elements, for highly exothermic and endothermic chemical reactions, wherein the required heat exchange, both in the liquid phase and in the gas phase, is forcibly effected in ...
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JPS6160052B2 |
Production of a mixture of dichlorobutenes by continuous chlorination in vapor phase of butadiene to a mixture of dichlorobutenes at a temperature about 90-250 DEG C, wherein chlorine is premixed with a portion of butadiene and introduce...
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JPS6142921Y2 |
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JPS61243176A |
PURPOSE: To increase the durability of a reactor and to carry out stable CVD for a long period by previously sticking inorg. powder to the inside of the reactor. CONSTITUTION: A gaseous mixture of silicon tetrachloride with propane and h...
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JPS6148584B2 |
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JPS6135562Y2 |
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JPS61227901A |
PURPOSE: To obtain a reforming furnace as a simple apparatus by reforming raw material gas by heat exchanging the raw material gas flowing through a reaction vessel with combustion gas flowing through a space between the reaction vessel ...
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JPS61212323A |
A process for the catalytic gaseous phase reaction of a reactive gas wherein the heat of reaction generated produces a temperature elevation of less than about 150 DEG C. in the substantially adiabatic reaction system, the improvement co...
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JPS61195976A |
PURPOSE: To increase the accumulation yield of a produced compd. in case of accumulating the produced compd. on a substrate having a rectangular cross- section in the inside of a reaction tube by providing a slanted substrate in the diag...
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JPS6133703B2 |
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JPS61167441A |
PURPOSE: To continue a vapor-phase synthesis reaction for a long time by providing a heater for keeping the temp. of the region close to the raw gas supply nozzle of a reaction tube at the crystallization temp., and providing a substrate...
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JPS6124372B2 |
PURPOSE:To carry out a reaction using an apparatus having a heat exchanger type reactor having a catalyst on the tube wall and capable of removing heat by a fluid refrigernt in the former stage of the apparatus and a heat insulating reac...
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JPS61118135A |
A reactor tube 20 for a high-temperature fluid wall reactor has a generally cylindrical shape and is made of a refractory material which permits the tube to be heated to incandescence. The reactor tube in turn radiates energy inwardly to...
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JPS6117766B2 |
Process and apparatus are provided for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free...
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JPS6117765B2 |
A method is disclosed for the plasma hydrogenation of silicon tetrachloride. A high pressure plasma is utilized to effect a reaction of hydrogen and silicon tetrachloride to form trichlorosilane and other hydrogenated silicon chlorides.
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JPS6146238A |
PURPOSE: To obtain the titled high-purity fine particles having uniform particle diameter without classifying the particles by supplying ≥2 kinds of substances in a gaseous state separately into a chamber under vacuum, and allowing the...
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JPS60255611A |
A method of producing ultrafine powders comprising metal silicide powder and the products produced by the method are disclosed. The ultrafine powders comprising metal silicide powders are ideally suited to form stable colloidal suspensio...
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JPS6054919B2 |
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JPS6049021B2 |
A device is provided for treating gases or mixtures of gases at high temperatures, such as, for example, for the reaction, known as tetraconversion, of silicon tetrachloride with hydrogen to form trichlorosilane. The device has a heat-in...
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JPS60195936A |
A plasma reactor system is described in which modularity is enhanced through automatic shutoff valves for gas lines, enabling components to be exchanged readily. Gas lines are routed through a connector at a predetermined location for al...
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