Title:
YTTRIUM-BASED FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2024/080251
Kind Code:
A1
Abstract:
Provided is an yttrium oxide film having Vickers hardness of 900 HV or more, in which the half width determined by an X-ray analysis of face (222) of an yttrium oxide crystal is 0.7° or more, the face (222) is predominantly aligned in the crystal structure of yttrium oxide, and the diffraction intensity of the face (222) in an X-ray analysis is twice or more those of other crystal faces. The yttrium oxide film can be formed on the surface of a component for which corrosion resistance, wear resistance, dust generation resistance and the like are required, and can be formed by any one method selected from a PVD method, a CVD method and an ALD method, particularly an ion-beam-assisted vapor deposition method.
Inventors:
SATO KAZUHIRO (JP)
TANABE KENICHI (JP)
TOKUNO YOSHICHIKA (JP)
TANABE KENICHI (JP)
TOKUNO YOSHICHIKA (JP)
Application Number:
PCT/JP2023/036593
Publication Date:
April 18, 2024
Filing Date:
October 06, 2023
Export Citation:
Assignee:
SHINCRON CO LTD (JP)
International Classes:
C23C14/08; C23C16/40
Domestic Patent References:
| WO2023008123A1 | 2023-02-02 |
Foreign References:
| JP2022145334A | 2022-10-04 | |||
| JPH0776048A | 1995-03-20 | |||
| JP2020097522A | 2020-06-25 |
Attorney, Agent or Firm:
TOKOSHIE PATENT FIRM (JP)
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