Title:
ULTRAVIOLET RADIATION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/113943
Kind Code:
A1
Abstract:
The present invention provides a deep ultraviolet radiation apparatus that is safe and has a high bacteria eliminating effect. Provided is an ultraviolet radiation apparatus in which an optical filter, that prevents the transmission of ultraviolet light of 240 nm or more emitted from a phosphor, is arranged facing the light emitting surface of a gas-discharging tube array-type surface-emitting ultraviolet light source device formed with a broad emission spectrum phosphor layer having a wavelength width of at least 210-250 nm, with a peak wavelength of 228 nm. Light irradiated from the light source device is incident on a filter membrane with the incident angle thereof being altered by a transparent substrate of the optical filter. An ozone generation space may be formed between the surface-emitting ultraviolet light source device and the optical filter.
Inventors:
SHINODA TSUTAE (JP)
HIRAKAWA HITOSHI (JP)
AWAMOTO KENJI (JP)
HIDAKA TAKEFUMI (JP)
TAKAHASHI JUNICHIRO (JP)
MAKINO TETSUYA (JP)
WAKIYA MASAYUKI (JP)
SHINODA YOKO (JP)
HIRAKAWA HITOSHI (JP)
AWAMOTO KENJI (JP)
HIDAKA TAKEFUMI (JP)
TAKAHASHI JUNICHIRO (JP)
MAKINO TETSUYA (JP)
WAKIYA MASAYUKI (JP)
SHINODA YOKO (JP)
Application Number:
PCT/JP2021/042827
Publication Date:
June 02, 2022
Filing Date:
November 22, 2021
Export Citation:
Assignee:
SHIKOH TECH CO LTD (JP)
International Classes:
H01J65/00; A61L2/10; A61L2/20; F21V9/06; H01J61/30; H01J61/44; H01J61/52
Domestic Patent References:
| WO2018235723A1 | 2018-12-27 |
Foreign References:
| JP2018114197A | 2018-07-26 | |||
| JP2018190686A | 2018-11-29 | |||
| JPH042001A | 1992-01-07 | |||
| JP2019017808A | 2019-02-07 | |||
| JP2011193929A | 2011-10-06 | |||
| JP2015193521A | 2015-11-05 |
Attorney, Agent or Firm:
NOGAWA, Shintaro et al. (JP)
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