Title:
ULTRAVIOLET LIGHT GENERATION TARGET, METHOD FOR MANUFACTURING ULTRAVIOLET LIGHT GENERATION TARGET, AND ELECTRON-BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE
Document Type and Number:
WIPO Patent Application WO/2020/129856
Kind Code:
A1
Abstract:
An ultraviolet light generation target (20) is provided with a light-emitting layer (22). The light-emitting layer (22) includes a YPO4 crystal to which at least scandium (Sc) has been added, and generates ultraviolet light UV upon reception of an electron beam EB. The method for manufacturing the ultraviolet light generation target (20) includes: a first step for producing a mixture that includes an yttrium (Y) oxide, a Sc oxide, phosphoric acid, and a liquid; a second step for evaporating the liquid; and a third step for firing the mixture. Accordingly, an ultraviolet light generation target provided with a light-emitting material useful for electron beam excitation different from Sc:Al203, a method for manufacturing the ultraviolet light generation target, and an electron-beam-excited ultraviolet light source can be realized.
Inventors:
ICHIKAWA NORIO (JP)
IKEDA KOHEI (JP)
IKEDA KOHEI (JP)
Application Number:
PCT/JP2019/049006
Publication Date:
June 25, 2020
Filing Date:
December 13, 2019
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
H01J63/04; H01J63/06
Domestic Patent References:
| WO2018235723A1 | 2018-12-27 |
Foreign References:
| JP2008536282A | 2008-09-04 | |||
| JP2017165877A | 2017-09-21 | |||
| JP2018104645A | 2018-07-05 | |||
| US20100225224A1 | 2010-09-09 | |||
| US20080231166A1 | 2008-09-25 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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