Title:
TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODUCTION METHOD FOR TARGET FOR ULTRAVIOLET LIGHT GENERATION
Document Type and Number:
WIPO Patent Application WO/2014/065028
Kind Code:
A1
Abstract:
A target for ultraviolet light generation is provided with a substrate that allows ultraviolet light to pass through and a light-emitting layer that is provided on the substrate and that receives an electron beam and generates ultraviolet light. The light-emitting layer includes: a polycrystalline film comprising an oxide polycrystal that contains Lu and Si to which an activator has been added; or a polycrystalline film comprising a rare earth-containing aluminum garnet polycrystal to which an activator has been added.
Inventors:
HONDA YOSHINORI (JP)
TAKETOMI HIROYUKI (JP)
FUKUYO FUMITSUGU (JP)
KAWAI KOJI (JP)
TAKAOKA HIDETSUGU (JP)
ICHIKAWA NORIO (JP)
SUZUKI TAKASHI (JP)
TAKETOMI HIROYUKI (JP)
FUKUYO FUMITSUGU (JP)
KAWAI KOJI (JP)
TAKAOKA HIDETSUGU (JP)
ICHIKAWA NORIO (JP)
SUZUKI TAKASHI (JP)
Application Number:
PCT/JP2013/074129
Publication Date:
May 01, 2014
Filing Date:
September 06, 2013
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
C09K11/00; C09K11/79; C09K11/80; H01J63/06
Foreign References:
| JP2012229306A | 2012-11-22 | |||
| JP2002057388A | 2002-02-22 | |||
| JP2008231218A | 2008-10-02 | |||
| JP2010024278A | 2010-02-04 | |||
| JP2010222403A | 2010-10-07 | |||
| JPH02225587A | 1990-09-07 | |||
| JP2006049284A | 2006-02-16 | |||
| JP2006520836A | 2006-09-14 |
Other References:
L PIDOL,A ET AL.: "Scintillation properties of Lu2Si207:Ce3+,a fast and efficient scintillator crystal", J. PHYS.; CONDENS. MATTER, vol. 15, 2003, pages 2091 - 2102, XP055254439
See also references of EP 2913378A4
See also references of EP 2913378A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)
Yoshiki Hasegawa (JP)
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