Title:
TARGET FOR PHYSICAL VAPOR DEPOSITION, NANOCOMPOSITE COATING FILM USING SAME, AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2019/045519
Kind Code:
A1
Abstract:
The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 at% of Si.
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Inventors:
LEE HAN CHAN (KR)
MOON KYOUNG IL (KR)
BANG GYUNG BAE (KR)
SHIN SEUNG YONG (KR)
PARK HYUN JUN (KR)
KIM TAE HWAN (KR)
YOON HAE WON (KR)
OH SE PIL (KR)
JUNG HUN (KR)
MOON KYOUNG IL (KR)
BANG GYUNG BAE (KR)
SHIN SEUNG YONG (KR)
PARK HYUN JUN (KR)
KIM TAE HWAN (KR)
YOON HAE WON (KR)
OH SE PIL (KR)
JUNG HUN (KR)
Application Number:
PCT/KR2018/010147
Publication Date:
March 07, 2019
Filing Date:
August 31, 2018
Export Citation:
Assignee:
KOREA INST IND TECH (KR)
International Classes:
C23C14/34; C22C16/00; C23C14/06
Foreign References:
KR20140144755A | 2014-12-22 | |||
KR20160051952A | 2016-05-12 | |||
KR20140143027A | 2014-12-15 | |||
JP2009263795A | 2009-11-12 | |||
JP2013511621A | 2013-04-04 |
Attorney, Agent or Firm:
LEE, In Haeng et al. (KR)
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